Instrument Details
Features
- Process chamber suitable for masks up to 9” x 9” or wafers up to Ø 12“ (Ø 300mm)
- Chucks available for 3 inch and 4 inch wafers
- Chucks available for 4 x 4 inch and 5 x 5 inch masks
Automatic ‘Dry In/Dry Out’ Acid Etch System – Osiris CHEMIXX MASK 30 E
