Instrument Details
Features
The system includes a number of unique features including:
- 50 kV column
- Overlay accuracy <10 nm
- Stich field accuracy <10 nm
- Universal sample holder for small chips to 3-inch wafers
- 4”x4” mask holder
- 4” wafer holder
- Interferometric stage with 100 x 100 mm2 x-y travel with 1 nm positioning accuracy
- 50 MHz pattern generator with 20-bit resolution
- Traxx option – stitch error-free fixed beam moving stage exposure
- User-selectable high throughput or high-resolution writing modes
