Xenon Difluoride Etcher – Xactix

Instrument Details

Features

• Release of metal and dielectric structures by selective isotropic etching of silicon
• Maximum wafer size: 100 mm
• Gases: XeF2 and N2

NUcore RESERVATION

Facility Contact

Main Contact: Ying Jia, PhD
Office: Tech, #FG71
(847) 467-2142 / email

Alternate Contact: Dr. Nasir Basit
(847) 467-6201 / email

Location