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Reactive Ion Etcher (RIE) – Samco RIE-10NR

Instrument Details

Features

  • Wafer size: up to 200 mm
  • Turbo pump backed by a dry roughing pump
  • RF Power: 13.56 MHz, 300 W
  • Six gas lines: CF4, CHF3, SF6, O2 (20 sccm), O2 (200 sccm), Ar/N2

Reactive Ion Etcher (RIE) – Samco RIE-10NR photo

NUcore RESERVATION

Facility Contact

Main Contact: Anil Dhote, PhD 
Office: Cook Hall 4087
(847) 491-5959 / email

Alternate Contact: Dr. Nasir Basit
847-467-6201 / email


Location

Technological Institute FG70