Plasma Enhanced Chemical Vapor Deposition (PECVD) – STS LpX CVD

Instrument Details

Features

• Wafer size: 100 mm
• Configured for SiO2, Si3N4, and a-Si deposition
• Vacuum Loadlock
• Gases: N2, Ar, He, N2O, 2%SiH4/N2, NH3, C4F8

NUcore RESERVATION

Facility Contact

Main Contact: Shaoning Lu, PhD
Office: Tech, #FG71
(847) 491-3853 / email

Alternate Contact: Dr. Nasir Basit
(847) 467-6201 / email

Location