The Arradiance ALD XT-P is full-featured ALD system capable of depositing highly conformal films over flat and patterned substrates and powders. Both metals and dielectrics can be deposited and multi-layer materials can be produced as well.
Instrument Details
Features
- 300 Watt plasma head for remote Plasma-Enhanced ALD (PEALD)
- Substrate heating to 500oC for thermal ALD
- Pulsed Vapor Push for low vapor pressure precursors
- Rotating cartridges for uniform coating of micro/nano particles
- Platen suitable for up to 8” substrates
- O2, N2, NH3, H2 and Ar gases for both thermal and plasma ALD
- Integrated gas safety interlock to prevent dangerous reactions
NUcore RESERVATION
Facility Contact
Main Contact: Serkan Butun, PhD
Office: Tech, #FG71
(847) 467-5959 / email
Location
Technological Institute FG70
