ALD – Savannah S100

Instrument Details

Features

• Substrate up to 4”
• Substrate heating to 300C for thermal ALD
• Pulsed precursor delivery
• ALD of dielectric films
• Precise control of films from the nano scale to the micro-scale.
• Conformal film growth

NUcore RESERVATION

Facility Contact

Main Contact: Anil Dhote, PhD
Office: Cook Hall 4087
847-491-5959 / email

Alternate Contact: Diego Santiago De La Vega
(847) 467-2015 / email

Location